for preparing samples and equipment
Ion implanter
Overall view
Ion source
Type
Duoplasmatron
Maximum voltage
30 kV
Beam current
200
m
A, DC
Target / Scattering chamber
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thin film preparator
evaporation method
ohmic heating
sputtering
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Hydrogen loading system
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Grazing-incidence flat-field-focusing soft-x-ray spectrometer
grating
measureable wave length range
1200grooves/mm
2400grooves/mm
10nm-70nm
5nm-50nm
recording device
Q-Plate
MCP
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