Facilities
Isono Lab has a clean room for micro/ nano fabrication processes
and an evaluation room for measurements & observations of the fabricated devices.
Clean room
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The clean room has some area with Yellow lighting, and we can conduct micro/ nano fabrication processes using UV lithography process.
[In normal-light area]
ICP-RIE machine, RIE machine, XeF2 etching machine, Furnace for thermal oxidation and diffusion,
Vacuum evaporation machine, Sputtering machine, and CVD machine
[In yellow-light area]
Double-side mask aligner and equipments for UV lithography process
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Evaluation room for measurements & observations
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The evaluation room has FE-SEM, AFM, optical microscope, and nano-indentation machine.
The room also has originally-developped machines for evaluations of fabricated devices .
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Equipments
｜ Etching ｜ Deposition ｜ Lithography ｜Post-process ｜Observation and measurement ｜
Etching and cleaning
| ICP-RIE |
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model : Multiplex ICP
(Sumitomo Precision)
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| RIE |
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model : RIE10NR
(SAMCO)
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| XeF2 dry etcher |
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model : none (none)
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| UV-O3 cleaner |
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model : UV-1
(SAMCO)
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Deposition and thin-film formation
| Vacuum Deposition System |
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model : VPC-260
(ULVAC KIKO, Inc.)
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| CVD (Chemical Vapor Deposition) |
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model : TVC-101 (VIC International)
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| Furnace (Thermal oxidation and diffusion) |
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model : KTF773N1 (KOYO THERMO SYSTEMS)
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| Sputter |
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model : L-210S-FH (ANELVA Co.)
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Lithography
| Double-side Mask Aligner |
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model : PEM800
(UNION OPTICAL CO., LTD.)
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| Spin-coater |
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model : SC-303
(Oshigane)
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Post-process
| Dicing saw |
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model : DAD-2/6H
(DISCO)
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| Manual Wire Bonder |
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model : HB10
(tpt)
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Observation and measurement
| FE-SEM |
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model : S-4800
(Hitachi Hi-tech)
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| AFM |
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model : SPI-3800N/SPA-300V
(SII)
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| Prober |
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model : none (none)
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| Nano indenter |
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model : ENT-1100
(ELIONIX)
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