type | Tandem PELLETRON 5SDH-2 (National Electrostatic Corporation, USA) |
Negative ion source | RF discharge source with Rb charge exchanger Source of Negative Ions by Cesium Sputtering |
Elements accelerated | almost all stable isotopes |
Terminal voltage | 1.7 MV |
Energy | proton 3.4 MeV - heavy ion 10 MeV |
Current | 0.1 - 10 mA, depending on ion species |
Beam lines | 5 |
600-mm diam. target chamber, 4 sets of charged particle detection systems, Ion implantor (Duoplasmatron:30keV/1mA) | |
Microbeam lens,
280-mm diam. ultrahigh-vacuum target chamber Low-energy ion source (microwave-discharge type; 50eV/0.05mA) | |
Chamber for student training experiments /
ion beam irradiation Student training experiments / ion beam irradiation | |
600-mm diam. target chamber 2 sets of charged particle detection systems | |
300-mm diam. target chamber / wave dispersion PIXE chamber |